The electron beam - resistive evaporation system is located in the larger class 100 clean room, and it was custom built for special coating applications of compound semiconductors. It has a six-pocket rotating e-beam crucible with 15 cc hearths. The system also has two filament evaporation stations. Hence, eight different materials can be loaded in the machine at any one time and evaporated in any random order. The system is also equipped with a cooled stage, heating lamps, and a rotating planetary.